Bühler Leybold Optics ion and plasma sources are designed to fit your machines and process technologies. They are developed as an assist source to control the properties during layer deposition, as a main source for sputter deposition (IBS) or as an etching source for material removal or substrate polishing.
Our portfolio of ion and plasma sources enables us to serve a broad range of applications.
Our ion and plasma sources are continuously developed and maintained to ensure their cutting-edge technology.
With decades of experience in source technology, we support you with your process needs.
The APSpro source provides ion energies up to 200 eV and is used as assist source in evaporation coaters for precision optics.
Source with ion energies up to 1000 eV, used as an assist source in evaporation coaters for precision optics.
RF source with ion energies up to 1500 eV, used as a sputter source in our ion beam figuring (IBF) and ion beam trimming (IBT) machines or as an assist source in optical coaters.
